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반응사출 성형기법을 이용한 반도체공정, 일반산업체의 유해 가스 및 소각장 다이옥신 제거 필터의 제조
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 이학준[이학준] | - |
| dc.date.accessioned | 2021-06-23T10:50:20Z | - |
| dc.date.available | 2021-06-23T10:50:20Z | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/37881 | - |
| dc.title | 반응사출 성형기법을 이용한 반도체공정, 일반산업체의 유해 가스 및 소각장 다이옥신 제거 필터의 제조 | - |
| dc.type | Patent | - |
| dc.contributor.affiliatedAuthor | 이학준[이학준] | - |
| dc.type.rims | PAT | - |
| dc.type.iprs | 특허 | - |
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Related Researcher
- Rhee, Hak june
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY (DEPARTMENT OF CHEMICAL AND MOLECULAR ENGINEERING)