Pareek, Shubhra; Jain, Deepti; Hussain, Shamima; Biswas, Amrita; Shrivastava, Rahul; Parida, Saroj K.; Kisan, Hemanta K.; Lgaz, Hassane; Chung, Ill-Min; Behera, Debasis
ArticleIssue Date2019CitationChemical Engineering Journal, v.358, pp 725 - 742PublisherElsevier BV