Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Mechanism of Embedded Micro/Nano Channel Formation for a Negative-tone Photoresist by Moving Mask Lithography
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Sang-Kon | - |
| dc.contributor.author | Oh, Hye-Keun | - |
| dc.contributor.author | Jung, Young-Dae | - |
| dc.contributor.author | An, Ilsin | - |
| dc.date.accessioned | 2021-06-23T13:38:06Z | - |
| dc.date.available | 2021-06-23T13:38:06Z | - |
| dc.date.issued | 2010-03 | - |
| dc.identifier.issn | 0374-4884 | - |
| dc.identifier.issn | 1976-8524 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/39948 | - |
| dc.description.abstract | Photoresist lithography has been applied in MEMS (micro electro mechanical systems). A flexible 3D (three-dimensional) micro/nano fabrication technique and its process simulation tool are required for 3D MEMS. This paper presents an UV (ultraviolet) lithography process simulation for the formation of an embedded micro/nano fluidic channel in a negative-tone photoresist. For this purpose, the moving-mask technology is modeled. The simulation algorithm of the nanolithography is applied for the micro-lithography. The validity of the simulation for the proposed 3D microstructuring is successfully confirmed by a, comparison between the experimental and the simulated results. Hence, modeling and simulation for the formation of various patterns of micro/nano fluidic channels in a negative-tone photoresist can be used to provide the photoresist characteristics and to optimize the lithography process conditions. | - |
| dc.format.extent | 5 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | KOREAN PHYSICAL SOC | - |
| dc.title | Mechanism of Embedded Micro/Nano Channel Formation for a Negative-tone Photoresist by Moving Mask Lithography | - |
| dc.type | Article | - |
| dc.publisher.location | 대한민국 | - |
| dc.identifier.doi | 10.3938/jkps.56.851 | - |
| dc.identifier.scopusid | 2-s2.0-77954856222 | - |
| dc.identifier.wosid | 000275624200030 | - |
| dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.56, no.3, pp 851 - 855 | - |
| dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
| dc.citation.volume | 56 | - |
| dc.citation.number | 3 | - |
| dc.citation.startPage | 851 | - |
| dc.citation.endPage | 855 | - |
| dc.type.docType | Article | - |
| dc.identifier.kciid | ART001429009 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | sci | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.description.journalRegisteredClass | kci | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
| dc.subject.keywordPlus | CHEMICALLY AMPLIFIED RESIST | - |
| dc.subject.keywordPlus | SIMULATION | - |
| dc.subject.keywordAuthor | Lithography | - |
| dc.subject.keywordAuthor | Lithography simulation | - |
| dc.subject.keywordAuthor | Negative resist | - |
| dc.subject.keywordAuthor | Chemically amplified resist | - |
| dc.subject.keywordAuthor | Multi-exposures | - |
| dc.subject.keywordAuthor | Inverse lithography | - |
| dc.subject.keywordAuthor | Embedded fluidic channels | - |
| dc.subject.keywordAuthor | MEMS | - |
| dc.identifier.url | https://www.jkps.or.kr/journal/view.html?volume=56&number=3&spage=851&year=2010 | - |
- Files in This Item
- Go to Link
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Jung, Young Dae
- ERICA 첨단융합대학 (ERICA 지능정보양자공학전공)