Successive nucleation and a rodlike growth of SiOx nanoparticles into the pore bottoms of an anodic alumina template
- Authors
- Jee, Sang-Won; Jung, Jin-Young; Seo, Hong-Seok; Park, Kwang-Tae; Das, Nando Dulal; Chai, Young Gyu; Lee, Jung-Ho
- Issue Date
- Oct-2009
- Publisher
- Elsevier BV
- Keywords
- Nanostructures; Annealing; Diffusion; Precipitation
- Citation
- Materials Chemistry and Physics, v.117, no.2-3, pp.478 - 481
- Indexed
- SCIE
SCOPUS
- Journal Title
- Materials Chemistry and Physics
- Volume
- 117
- Number
- 2-3
- Start Page
- 478
- End Page
- 481
- URI
- https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40796
- DOI
- 10.1016/j.matchemphys.2009.06.031
- ISSN
- 0254-0584
- Abstract
- Although the SiOx nanoparticles were previously reported to electrochemically nucleate from the bottoms of the pore array formed in the AAO/Ti/Si system, new applications of anodic aluminum oxide templates, i.e., successive nucleation and a rodlike growth of SiOx nanoparticles, were observed utilizing the subsequent annealing technique after the nanoparticle precipitation. Tailoring the pore bottom profile by doping type and level of wafers; also critically affected to nucleate the SiOx nanoparticles from the pore bottoms. By anodization, as previously reported, only one nanoparticle per each pore was generally precipitated from the pyramid-shaped Si-containing TiOx nanopillars; however, subsequent annealing under a low pressure of hydrogen enabled the successive precipitation of nanoparticles. Annealing under atmospheric pressure with H-2 and N-2 resulted in the rodlike growth of a single nanoparticle without successive nanoparticle precipitation. (C) 2009 Elsevier B.V. All rights reserved.
- Files in This Item
-
Go to Link
- Appears in
Collections - COLLEGE OF ENGINEERING SCIENCES > DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/40796)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.