Line edge roughness and line width roughness analysis of molecular simulation for chemically amplified resist

안일신

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Line edge roughness and line width roughness analysis of molecular simulation for chemically amplified resist

Authors: 안일신

Issue Date: 20-Feb-2009

Publisher: SEMI

Citation: Proceedings of SEMI Technology Symposium 2009

Journal Title: Proceedings of SEMI Technology Symposium 2009

URI: https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/41388

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Appears in Collections: COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY > DEPARTMENT OF PHOTONICS AND NANOELECTRONICS > 1. Journal Articles

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