크로스토크 방지 기술을 적용한 칩 제작기법에서의 클럭 넷 쉴드 처리에 의한 셀 면적 오버헤드 개선
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이준섭 | - |
dc.contributor.author | 송재훈 | - |
dc.contributor.author | 김민철 | - |
dc.contributor.author | 김기범 | - |
dc.contributor.author | 박성주 | - |
dc.date.accessioned | 2021-06-23T17:38:35Z | - |
dc.date.available | 2021-06-23T17:38:35Z | - |
dc.date.issued | 2008-06 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/42392 | - |
dc.description.abstract | With the semiconductor industry evolving into the deep sub-micron (DSM) era, the crosstalk effects on interconnect lines of a chip have increasingly caused a major bottleneck for design closure. In this paper, we propose an effective design guide line to reduce cell area overhead without crosstalk noise violations by using crosstalk prevention flow with clock shielding. | - |
dc.format.extent | 2 | - |
dc.language | 한국어 | - |
dc.language.iso | KOR | - |
dc.publisher | 대한전자공학회 | - |
dc.title | 크로스토크 방지 기술을 적용한 칩 제작기법에서의 클럭 넷 쉴드 처리에 의한 셀 면적 오버헤드 개선 | - |
dc.title.alternative | Improvement of cell area overhead for crosstalk prevention design flow by using clock shielding | - |
dc.type | Article | - |
dc.publisher.location | 대한민국 | - |
dc.identifier.bibliographicCitation | 대한전자공학회 2008년 하계종합학술대회 논문집, v.31, no.1, pp 445 - 446 | - |
dc.citation.title | 대한전자공학회 2008년 하계종합학술대회 논문집 | - |
dc.citation.volume | 31 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 445 | - |
dc.citation.endPage | 446 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | other | - |
dc.identifier.url | https://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE01017090 | - |
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