Ellipsometry for nano-fabrication

Abstract

Ellipsometry has long been used for the characterization of thin films and surfaces. It can determine both the optical properties and the microstructural parameters of films. However its spatial resolution is poor in contrast to its sub-nanometer resolution for thickness. Despite this drawback, it can contribute to the studies of nano-scaled materials and nano-device fabrications either in direct way or in indirect way. In this work, principles of various ellipsometers are introduced. Also some applications of these ellipsometers are introduced for the characterization of nano-structured materials and industrial processing for nano-devices