Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
In situ Particle Monitoring(ISPM) System Development with Ion Counting Method and its Performance Evaluation in Vacuum Environment
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안강호 | - |
| dc.date.accessioned | 2021-06-23T21:03:31Z | - |
| dc.date.available | 2021-06-23T21:03:31Z | - |
| dc.date.created | 2021-02-18 | - |
| dc.date.issued | 2006-11-15 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/44481 | - |
| dc.publisher | CUP | - |
| dc.title | In situ Particle Monitoring(ISPM) System Development with Ion Counting Method and its Performance Evaluation in Vacuum Environment | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | 안강호 | - |
| dc.identifier.bibliographicCitation | 7th Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments | - |
| dc.relation.isPartOf | 7th Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments | - |
| dc.citation.title | 7th Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 3 | - |
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.