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The Absorber Shape Dependency of Pattern Printability for Extreme Ultraviolet Lithography (EUVL)
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T22:02:40Z | - |
| dc.date.available | 2021-06-23T22:02:40Z | - |
| dc.date.created | 2021-02-18 | - |
| dc.date.issued | 2006-02-23 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/45019 | - |
| dc.publisher | 한국물리학회 | - |
| dc.title | The Absorber Shape Dependency of Pattern Printability for Extreme Ultraviolet Lithography (EUVL) | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | 13회 한국반도체학술대회 | - |
| dc.relation.isPartOf | 13회 한국반도체학술대회 | - |
| dc.citation.title | 13회 한국반도체학술대회 | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 3 | - |
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