Development of in-situ SUB-100nm particle detection in vacuum system
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ahn, Kang-Ho | - |
dc.contributor.author | Kim, Yong-min | - |
dc.date.accessioned | 2021-06-23T22:39:22Z | - |
dc.date.available | 2021-06-23T22:39:22Z | - |
dc.date.issued | 2006-10 | - |
dc.identifier.issn | 1013-9826 | - |
dc.identifier.issn | 1662-9795 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/45375 | - |
dc.description.abstract | A feasibility test for real-time fine particle measurements in vacuum semiconductor processing equipment has been conducted. The approach in monitoring particles in process equipment is an installation of a sensor at a critical location inside the process equipment (hence the term 'in-situ') to track free particle levels in real-time. Common method for particle detection in a process chamber today is a use of test wafer with a laser wafer scanner. However, this method does not give a real time information of the particle status in the process chamber. In this paper, a new method has been developed to detect particles in real time in vacuum system for particles smaller than an optical method can detect. The system consists of a particle charging region and a particle detection region in a vacuum system. Particles with 50nm are successfully detected at about 10 torr region. | - |
dc.format.extent | 4 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | Trans Tech Publications Ltd. | - |
dc.title | Development of in-situ SUB-100nm particle detection in vacuum system | - |
dc.type | Article | - |
dc.publisher.location | 스위스 | - |
dc.identifier.doi | 10.4028/www.scientific.net/KEM.321-323.1707 | - |
dc.identifier.scopusid | 2-s2.0-33749455358 | - |
dc.identifier.wosid | 000241427900384 | - |
dc.identifier.bibliographicCitation | Key Engineering Materials, v.321-323, pp 1707 - 1710 | - |
dc.citation.title | Key Engineering Materials | - |
dc.citation.volume | 321-323 | - |
dc.citation.startPage | 1707 | - |
dc.citation.endPage | 1710 | - |
dc.type.docType | Article; Proceedings Paper | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Characterization & Testing | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Composites | - |
dc.subject.keywordAuthor | particle charging in vacuum | - |
dc.subject.keywordAuthor | vacuum particle | - |
dc.subject.keywordAuthor | semiconductor processing equipment | - |
dc.subject.keywordAuthor | monodisperse particle | - |
dc.subject.keywordAuthor | corona charging | - |
dc.subject.keywordAuthor | Faraday cup | - |
dc.identifier.url | https://www.scientific.net/KEM.321-323.1707 | - |
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