Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Optimizing ArF photoresist parameter to reduce mask error factor (MEF)
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-23T23:38:56Z | - |
| dc.date.available | 2021-06-23T23:38:56Z | - |
| dc.date.created | 2021-02-18 | - |
| dc.date.issued | 2005-04-13 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46007 | - |
| dc.publisher | SPIE | - |
| dc.title | Optimizing ArF photoresist parameter to reduce mask error factor (MEF) | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | Photomask Japan 2005 | - |
| dc.relation.isPartOf | Photomask Japan 2005 | - |
| dc.citation.title | Photomask Japan 2005 | - |
| dc.type.rims | ART | - |
| dc.description.journalClass | 3 | - |
- Files in This Item
- There are no files associated with this item.
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.