Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ha, Mi-Ae | - |
dc.contributor.author | OH, HYE KEUN | - |
dc.date.accessioned | 2021-06-24T00:05:45Z | - |
dc.date.available | 2021-06-24T00:05:45Z | - |
dc.date.issued | 2005-05 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.issn | 1976-8524 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46365 | - |
dc.description.abstract | This paper searches for the scattering bar behavior and the extent of mask bias that may reduce the aerial image errors by reducing the mask error factor (MEF) for isolated and dense patterns. The merit of using scattering bars at the mask for the optical proximity correction (OPC) is examined for a potential reduction in the MEF by optimizing the 0th diffraction order. A MEF minimization through the use of an isolated-dense bias and optimum placement of a scattering bar with the different pitches can increase the common process latitude and can decrease the minimum feature size. | - |
dc.format.extent | 5 | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | 한국물리학회 | - |
dc.title | Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography | - |
dc.type | Article | - |
dc.publisher.location | 대한민국 | - |
dc.identifier.scopusid | 2-s2.0-19944365061 | - |
dc.identifier.wosid | 000229129900028 | - |
dc.identifier.bibliographicCitation | Journal of the Korean Physical Society, v.46, no.1, pp 1213 - 1217 | - |
dc.citation.title | Journal of the Korean Physical Society | - |
dc.citation.volume | 46 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 1213 | - |
dc.citation.endPage | 1217 | - |
dc.identifier.kciid | ART000942119 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.subject.keywordPlus | CHEMICALLY AMPLIFIED RESIST | - |
dc.subject.keywordPlus | OPC | - |
dc.subject.keywordPlus | OPTIMIZATION | - |
dc.subject.keywordAuthor | MEF | - |
dc.subject.keywordAuthor | OPC | - |
dc.subject.keywordAuthor | Scattering bar | - |
dc.subject.keywordAuthor | Diffraction order | - |
dc.subject.keywordAuthor | Lithography | - |
dc.subject.keywordAuthor | Simulation | - |
dc.identifier.url | https://www.jkps.or.kr/journal/download_pdf.php?spage=1213&volume=46&number=5 | - |
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