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Aerial image characteristics of modified absorber model for extreme ultraviolet lithography (EUVL)
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kang, In-Yong | - |
| dc.contributor.author | Ahn, Jinho | - |
| dc.contributor.author | Oh, Hye-Keun | - |
| dc.contributor.author | Chung, Yone-Chae | - |
| dc.date.accessioned | 2021-06-24T00:08:24Z | - |
| dc.date.available | 2021-06-24T00:08:24Z | - |
| dc.date.issued | 2005-10 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46461 | - |
| dc.description.abstract | [No abstract available] | - |
| dc.format.extent | 2 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IEEE | - |
| dc.title | Aerial image characteristics of modified absorber model for extreme ultraviolet lithography (EUVL) | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.scopusid | 2-s2.0-33847230967 | - |
| dc.identifier.bibliographicCitation | Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference, v.2005, pp 84 - 85 | - |
| dc.citation.title | Digest of Papers - Microprocesses and Nanotechnology 2005: 2005 International Microprocesses and Nanotechnology Conference | - |
| dc.citation.volume | 2005 | - |
| dc.citation.startPage | 84 | - |
| dc.citation.endPage | 85 | - |
| dc.type.docType | Conference Paper | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scopus | - |
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