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Photoinduced patterning of gold thin film
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | An, Ilsin | - |
| dc.contributor.author | Seong, Deokkyeong | - |
| dc.contributor.author | Oh, Hyekeun | - |
| dc.date.accessioned | 2021-06-24T00:39:28Z | - |
| dc.date.available | 2021-06-24T00:39:28Z | - |
| dc.date.issued | 2004-08 | - |
| dc.identifier.issn | 0021-4922 | - |
| dc.identifier.issn | 1347-4065 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/46565 | - |
| dc.description.abstract | We report a novel etching technique for gold film based on a new phenomenon that gold is soluble in chlorine-containing solutions or solvents under UV irradiation. This is a promising method for gold patterning possibly in microdevice or nanodevice fabrication. Mask patterns can be transferred to a gold surface directly without resorting to a complex photoresist process, and etch rate can be controlled from sub-nanometer to a few tens of nanometers per minute by adjusting exposure parameters. Moreover, nontoxic liquid such as NaCl solution can be used for the process. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | IOP Publishing Ltd | - |
| dc.title | Photoinduced patterning of gold thin film | - |
| dc.type | Article | - |
| dc.publisher.location | 영국 | - |
| dc.identifier.doi | 10.1143/JJAP.43.L1078 | - |
| dc.identifier.scopusid | 2-s2.0-6444231255 | - |
| dc.identifier.wosid | 000224781000011 | - |
| dc.identifier.bibliographicCitation | Japanese Journal of Applied Physics, v.43, no.8B, pp L1078 - L1080 | - |
| dc.citation.title | Japanese Journal of Applied Physics | - |
| dc.citation.volume | 43 | - |
| dc.citation.number | 8B | - |
| dc.citation.startPage | L1078 | - |
| dc.citation.endPage | L1080 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | SELF-ASSEMBLED MONOLAYERS | - |
| dc.subject.keywordPlus | FABRICATION | - |
| dc.subject.keywordPlus | ELLIPSOMETRY | - |
| dc.subject.keywordPlus | EVOLUTION | - |
| dc.subject.keywordAuthor | gold | - |
| dc.subject.keywordAuthor | etch | - |
| dc.subject.keywordAuthor | UV | - |
| dc.subject.keywordAuthor | chlorine | - |
| dc.subject.keywordAuthor | patterning | - |
| dc.identifier.url | https://iopscience.iop.org/article/10.1143/JJAP.43.L1078 | - |
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