Pattern degradation with larger particles on EUV pellicle
DC Field | Value | Language |
---|---|---|
dc.contributor.author | No, H.-R. | - |
dc.contributor.author | Lee, S.-G. | - |
dc.contributor.author | Oh, S.-H. | - |
dc.contributor.author | Oh, H.-K. | - |
dc.date.accessioned | 2021-06-22T13:02:44Z | - |
dc.date.available | 2021-06-22T13:02:44Z | - |
dc.date.created | 2021-01-22 | - |
dc.date.issued | 2018-10 | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/7928 | - |
dc.description.abstract | Particle defects placed on extreme-ultraviolet (EUV) pellicle can degrade pattern quality due to the particle defect shadowing. It is obvious that serious patterning error would be occurred due to larger particle defects on top of the pellicle, so that the effect of critical dimension (CD) degradation caused by particle defect on top of the EUV pellicle is investigated. We tried to determine the maximum allowable particle defect size with various pattern types and nodes via commercial simulation tool. Also, we set the boundaries for CD error limit of 5 % and CD non-uniformity to 0.2 nm. Based on these result, we determined the maximum allowable particle defect size for N5 and N7 nodes in order to find the proper defect control. Copyright © 2018 SPIE. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | SPIE | - |
dc.title | Pattern degradation with larger particles on EUV pellicle | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Oh, H.-K. | - |
dc.identifier.doi | 10.1117/12.2502784 | - |
dc.identifier.scopusid | 2-s2.0-85058341762 | - |
dc.identifier.bibliographicCitation | Proceedings of SPIE - The International Society for Optical Engineering, v.10809 | - |
dc.relation.isPartOf | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.title | Proceedings of SPIE - The International Society for Optical Engineering | - |
dc.citation.volume | 10809 | - |
dc.type.rims | ART | - |
dc.type.docType | Conference Paper | - |
dc.description.journalClass | 1 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | Extreme ultraviolet lithography | - |
dc.subject.keywordPlus | CD non-uniformity | - |
dc.subject.keywordPlus | CD Uniformity | - |
dc.subject.keywordPlus | Critical dimension | - |
dc.subject.keywordPlus | Defect control | - |
dc.subject.keywordPlus | Defect size | - |
dc.subject.keywordPlus | EUV pellicle | - |
dc.subject.keywordPlus | Extreme ultraviolets | - |
dc.subject.keywordPlus | Pattern quality | - |
dc.subject.keywordPlus | Defects | - |
dc.subject.keywordAuthor | CD degradation | - |
dc.subject.keywordAuthor | CD uniformity | - |
dc.subject.keywordAuthor | EUV lithography | - |
dc.subject.keywordAuthor | EUV pellicle | - |
dc.subject.keywordAuthor | particle defect | - |
dc.identifier.url | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/10809/2502784/Pattern-degradation-with-larger-particles-on-EUV-pellicle/10.1117/12.2502784.short | - |
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