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Thermal deformation behavior with absorber for extreme ultraviolet mask
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오혜근 | - |
| dc.date.accessioned | 2021-06-22T13:06:51Z | - |
| dc.date.available | 2021-06-22T13:06:51Z | - |
| dc.date.created | 2020-12-17 | - |
| dc.date.issued | 2018-02-26 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/erica/handle/2021.sw.erica/8149 | - |
| dc.publisher | SPIE | - |
| dc.title | Thermal deformation behavior with absorber for extreme ultraviolet mask | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 오혜근 | - |
| dc.identifier.bibliographicCitation | Advanced Lithography | - |
| dc.relation.isPartOf | Advanced Lithography | - |
| dc.citation.title | Advanced Lithography | - |
| dc.citation.conferencePlace | San Jose, California, United States | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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