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Experimental Decomposition of the Positive Gate-bias Temperature Stress-induced Instability and Its Modeling in InGaZnO Thin-film Transistors

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dc.contributor.author오새룬터-
dc.date.accessioned2021-06-22T13:48:38Z-
dc.date.available2021-06-22T13:48:38Z-
dc.date.issued20170830-
dc.identifier.urihttps://scholarworks.bwise.kr/erica/handle/2021.sw.erica/9373-
dc.titleExperimental Decomposition of the Positive Gate-bias Temperature Stress-induced Instability and Its Modeling in InGaZnO Thin-film Transistors-
dc.typeConference-
dc.citation.conferenceNameInternational Meeting on Information Display (IMID)-
dc.citation.conferencePlaceBEXCO, Busan, Korea-
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COLLEGE OF ENGINEERING SCIENCES > SCHOOL OF ELECTRICAL ENGINEERING > 2. Conference Papers

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