Journal of Micro/ Nanolithography, MEMS, and MOEMS
Journal Title
- Journal of Micro/ Nanolithography, MEMS, and MOEMS
ISSN
- E 1932-5134 | P 1932-5150
Publisher
- S P I E - International Society for Optical Engineering
Listed on(Coverage)
| JCR |
2010-2019 |
| SJR |
2003-2019 |
| CiteScore |
2011-2019 |
| SCIE |
2010-2021 |
| CC |
2016-2021 |
| SCOPUS |
2017-2020 |
Aime & Scopes
- The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) publishes peer-reviewed papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, microelectromechanical systems, micro-optoelectromechanical systems, and photonics industries. The wide range of such devices also includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal. Topical areas covered include:
Lithography
Tools, materials, and processes associated with the patterning of structures that have submicrometer and nanometer-scale features. Included are imaging and nonimaging approaches using optics, electron and other particle beams, nanoimprint, molecular self-assembly, and their hybrids. Applications include semiconductor fabrication, but also patterning for other micro/nanodevices.
Microelectromechanical systems (MEMS)
The design, fabrication, operation, reliability, and testing of microdevices that contain both electrical and mechanical elements.
Micro-optoelectromechanical systems (MOEMS)
The design, fabrication, operation, reliability, and testing of microdevices that contain electrical, mechanical, and optical elements (that is, the merging of micro-optics and MEMS).
Microfabrication
Technologies to shape three-dimensional structures leading to the fabrication of active and passive electronics, photonics, MEMS, MOEMS, micro/nano-optics, and other micro/nanodevices.
Metrology
Metrology and process control for the above devices and their fabrication processes.