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Chemical Vapor Deposition

Journal Title

  • Chemical Vapor Deposition

ISSN

  • E 1521-3862 | P 0948-1907 | 1521-3862 | 0948-1907

Publisher

  • John Wiley & Sons Ltd.
  • Wiley-Blackwell

Listed on(Coverage)

JCR1997-2017
SJR1999-2018
CiteScore2011-2016
SCI2010-2017
SCIE2010-2017
CC2016-2017
SCOPUS2017-2020

Active

  • Inactive

Country

  • ENGLAND

Article List

1 - 1 out of 1 results.

SCIESCOPUS
Freestanding Ge/SiO2 Core/Shell Nanoparticles Formed via Metastable SiO2 Hollow Nanospheres on a Si WaferGo to Link

Park, Kwang-Tae; Um, Han-Don; Jee, Sang-Won; Jung, Jin-Young; Park, Yun Chang; Yang, Jun Mo; Lee, Jung-Ho

ArticleIssue Date2008CitationChemical Vapor Deposition, v.14, no.11-12, pp.331 - 333PublisherJohn Wiley & Sons Ltd.
1
STATISTICS
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