ScholarWorks@Hanyang University ERICA Campus: Son, Seung-Woo

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Son, Seung-Woo (손승우)

COLLEGE OF ADVANCED TECHNOLOGY AND CONVERGENCE (MAJOR IN INTELLIGENCE INFORMATION AND QUANTUM TECHNOLOGY)

Research Area: 통계 물리, 복잡계, 비선형 동역학, Statistical Physics, Complex Systems, Nonlinear Dynamics

Tel 031-400-5473
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source optimization:5||EUV lithography:5||EUV:4||highNA:4||Thermal deformation:4||Overlay error:3||LCDU:3||EPE:3||Wafer heating:3||Complex networks:3||selfassembly:2||Network motifs:2||COMPLEX NETWORKS:2||Prisoner's dilemma game:2||graphene:2||block copolymer:2||high NA:2||EXPLOSIVE PERCOLATION:2||optical proximity correction:2||WEB:2||Football game events:1||Forecasting open systems:1||Freeflow and trafficjam clusters:1||GELATION:1||Growing networks:1||Gyroid Pattern:1||HighNA:1||HyperNA:1||INTERNET:1||Interdisciplinary Approach:1||Internet router:1||Kpop:1||LONGRANGE ORDER:1||Large mask:1||Lighting Design:1||Link percolation:1||LowNA:1||Lyrics:1||MODEL:1||MODELS:1||Mask heating:1||Metalsilicide composites:1||Metric learning:1||NETWORKS:1||Natural Language Processing:1||Natural language processing:1||Network:1||Network among words:1||Network analysis:1||Optical lithography:1||Overlay:1||Overlay correction:1||Patent:1||Pellicle lifetime:1||Pellicles:1||Percolation:1||Pinhole defect:1||Pixelated polarization:1||Presidential speeches:1||Quarantine:1||Random walks:1||Road network:1||SCALEFREE NETWORKS:1||SCALING THEORY:1||STABILITY:1||SYNCHRONIZATION:1||Scaling exponent:1||Scaling relation:1||Selfassembly:1||Signed directional complex networks:1||Social dynamics:1||Source Optimization:1||Source power:1||Spatial traffic correlation:1||Strategies:1||Structural properties:1||Stylometry:1||Temporal networks:1||Thermal stress:1||Traffic data:1||Triplet loss:1||Urban road networkDetour indexCoreperiphery structureUniversal behavior:1||Urban road networks:1||User Perception:1||User analysis:1||VOCs sensor:1||Vaccination:1||Word2Vec:1||Writer:1||Zipf's law:1||basin stability:1||bifurcation:1||block copolymers:1||cluster aggregation:1||combinatorics:1||computational lithography:1||contact hole. dram pattern:1||defect:1||directed selfassembly:1||exposure slit:1||flexible:1||generalized Kuramoto model:1||generating function:1||hierarchical structures:1||illumination:1||ion gel:1||laser:1||logic metal layer:1||machinelearning:1||mask heating:1||nanopattern:1||optical proximity  correction:1||overlay:1||pattern orientation:1||percolation problems:1||phase diagrams:1||photothermal effect:1||polarized illumination:1||power grid:1||protein interaction networks:1||random interaction:1||single exposure patterning:1||slit effect:1||strain compensation:1||synchronization:1||thermal deformation:1||through pitch:1||volcano transition:1||wrinkles:1||다학제적 접근:1||디자인 수용의도:1||딥러닝:1||메트릭 학습:1||사용자 분석:1||사용자 인지:1||삼중항 손실:1||자연어 처리:1||자연어처리:1||자이로이드 패턴:1||조명 디자인:1||6 × 12 mask:1||특허:1||ACHLIOPTAS PROCESS:1||ATTACK:1||Achlioptas process:1||Achlioptas processes:1||Analytic solutions:1||BEHAVIOR:1||Carbon nanotubes:1||Cartogramenhanced deep learning:1||DRAM critical layer:1||DYNAMICS:1||Deep Learning:1||Demographic study:1||Design Acceptance:1||EUVL:1||EbolavirusMarburgvirusSinglenucleotide polymorphism (SNP)Agent based model:1||Epidemic model:1||Explosive phase transition:1||Extreme ultraviolet lithography:1||Finite element simulation:1||

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55 Hanyangdeahak-ro, Sangnok-gu, Ansan, Gyeonggi-do, 15588, Korea+82-31-400-4269

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