ScholarWorks@Hanyang University ERICA Campus: PARK, JIN SEOK

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PARK, JIN SEOK (박진석)

ERICA 공학대학 (SCHOOL OF ELECTRICAL ENGINEERING)

Research Area: 박막 및 나노소자

Tel 031-400-5166
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Carbon nanotubes (CNTs):10||Carbon nanotubes:10||Transmittance:7||Sheet resistance:6||Stability:4||Field emission:4||Resistivity:4||Thermal treatment:4||Bending test:4||Longterm stability:3||Membranestructure:3||Reflectance:3||Field emission property:3||Electrophoretic deposition:3||Metal electrode:3||Electrophoretic deposition (EPD):3||Cosputtering:3||Longterm stability.:3||Massloading effect:3||Film bulk acoustic resonator (FBAR):3||Visible transmittance:3||Thin film transistor (TFT):3||Carbon nanotube (CNT):3||Carbon nanotube:2||Direct growth:2||carbon nanotubes (CNTs):2||cathodoluminescence:2||surface roughness:2||Sputtering:2||Field emission properties:2||Insitu gas addition:2||twostep deposition:2||Substratebias effect:2||正會員 : 漢陽大 電子電氣制御計測工學科 工學博士Email : ckpark@hanyang.ac.kr*正 會 員 : 漢陽大 電子電氣制御計測工學科 博士課程:2||Fieldemissive property:2||Flexibility:2||Flexible transparent electrode:2||Inductivelycoupled plasma vapor deposition (ICPCVD).1. 서 론†교신저자:2||Aluminum nitride (AlN):2||Amorphous carbon nitride:2||Chromaticity:2||Plasma posttreatment:2||Frequency response.1. 서 론*學生會員 : 漢陽大學 電子電氣制御計測工學科 工學碩士:2||filtered cathodic vacuum arc:2||inductively coupled plasma chemical vapor deposition (ICPCVD):2||Coronaplasma treatment:2||6HSiC:2||Xray imaging:2||RF magnetron sputtering:2||Xray photoelectron spectroscopy (XPS):2||nitrogen incorporation:2||Zinc oxide (ZnO):2||polycrystalline diamond films:2||Sidoped ZnO (SZO):2||Silver nanowire:2||Nanostructure:2||Hotpressing:1||Hybrid flexible electrodes:1||Hybridtype transparent electrodes:1||Hydrogen (H):1||ITO:1||Indium zinc oxide (IZO):1||Indiumzincoxide (IZO):1||Inductively coupled plasma chemical vapor deposition:1||Inductively coupled plasma Chemical vapor deposition (ICPCVD):1||Inductively coupled plasmachemical vapor:1||Inductively coupled plasmachemical vapor deposition:1||Li coating:1||Lithographyfree mesh formation:1||LongTerm Stability:1||Longterm exposure:1||Longtermstability:1||Mechanical compression:1||Metalmeshes:1||Microtip XRay Electron Source:1||NANOSTRUCTURE:1||NANOTUBES:1||Ni and Co catalysts:1||Nickel coating:1||Nitrogen addition:1||Optical property:1||Optical transmittance:1||Oxidation stability:1||Oxide TFT:1||OxideTFT:1||PANEL:1||PEDOT:1||PEDOT:PSS:1||PEDOT:PSS (poly (3,4ethylenedioxythiophene):poly (styrenesulfonate)):1||PEDOT:PSS polymers:1||PET SUBSTRATE:1||PET substrate:1||POLYMER SOLARCELLS:1||Passivation:1||Plasma treatment:1||Polyethylene terephthalate (PET) substrates:1||Program educational objectives:1||Pulsed laser deposition:1||RAMANSPECTROSCOPY:1||REDUCED GRAPHENE OXIDE:1||Random mesh:1||SILVER NANOWIRES:1||SIMS:1||SZObased TFT:1||Selective growth:1||Silver nanowire (AgNW):1||Spin coating:1||Spincoating:1||Spray coating:1||Spraycoating:1||Spraycoating method:1||Sputtering power:1||Structural analysis:1||Structural property:1||Summative evaluation:1||Surface damage:1||Surface modification:1||Surface roughness:1||THINFILMS:1||Thermal annealing:1||2step deposition:1||Thin film transistors (TFTs):1||Tipangle:1||Tiptype field emitters:1||Tiptype metal substrate:1||Titanium carbide (TiC):1||Touch screen panels:1||Transparent conducting (TC) film:1||Transparent electrode:1||Transparent electrodes:1||Transparent electrodes for touch screen panels:1||Xray photoelectron spectroscopy:1||Xray reflectivity:1||XPS:1||Yellowness:1||Zinc oxide(ZnO):1||ZnO:1||ZnO and ZnO:Ga thin films:1||ZnO:Ga (GZO) thin films:1||aIZO TFT:1||bandA emission:1||biasenhanced nucleation:1||buffer materials:1||caxis growth:1||carbon nanotube:1||carbon nanotubes:1||carbonization:1||chromaticity:1||copper mesh:1||cyclic deposition:1||deposition (ICPCVD):1||diamond:1||diamond film:1||diamond films:1||diamondlike carbon:1||diamondlike properties:1||electric biasing:1||electrical resistivity:1||electromechanical coupling coefficient:1||electron field emission:1||electrophoretic deposition:1||electrophoretic deposition (EPD):1||emission current stability:1||epitaxy:1||field emission:1||fieldemission property:1||fieldemissive property:1||film bulk acoustic resonator:1||frequency response:1||hybridtype transparent conductive electrodes:1||insertion loss:1||longterm emission stability:1||metallic interlayer:1||microfocus xray tube:1||microwave plasmaassisted CVD:1||multilayers:1||nanostructure:1||nickel coating:1||nitrogenrelated band:1||oxidation stability:1||oxygen additive:1||oxygen plasma:1||piezoelectric property:1||plasma processing and deposition:1||polarity:1||polycrystalline ZnO:1||reactive ion etching:1||reflectance:1||secondary nucleation:1||stability:1||step flow:1||structural property:1||sublimation:1||substrate bias:1||substratebias effect:1||surface acoustic wave:1||tensile stress:1||tetrahedral amorphous carbon:1||thermal annealing:1||thermal treatment:1||transparentoxide thinfilm transistor (TFT):1||twomask process:1||Thin film transistor:1||2D island:1||ADHESION:1||Active layer:1||Ag mesh electrodes:1||Air stability:1||Al interlayer coating:1||AlN:1||Aluminum nitride (AIN):1||Amorphous Boron Nitride:1||Amorphous Carbon Nitride:1||Amorphous carbon nitrides:1||Buffer materials:1||CNT:1||CVD:1||Carbon Nanotubes:1||Chemical analysis:1||Chemical bonding:1||Chromaticity properties:1||Cobalt tip:1||Cold cathode for Xray tubes:1||Conductive polymers:1||Contact angle:1||Contact resistance:1||Coppermesh:1||Corona pretreatment:1||Corona treatment:1||Crystal quality:1||Cudoped ZnO:1||DEVICES:1||Diagnostic evaluation:1||Double active layer:1||ELECTRICALPROPERTIES:1||ELECTROPHORETIC DEPOSITION:1||Electrical property:1||Electropolymerization:1||Electron emission:1||Electronbeam focusing:1||Electronemission properties:1||Electroplating:1||Emission stability:1||Engineering accreditation:1||FABRICATION:1||Field Emission:1||Field electron emission:1||Fieldemission property:1||Flexible transparent electrodes:1||Formative evaluation:1||Frequency response:1||Furnaceannealing:1||Graytone mask (GTM):1||Gridpattern formation:1||HIGHPERFORMANCE:1||HIGHLY TRANSPARENT:1||Hafniumaluminumzincoxide (HAZO):1||Haze:1||

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