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Influence of Oxygen to Argon Ratio on the Optical Band Gap of Bi3.25La0.75Fe1Ti2O12 Thin Films Deposited by RF Sputtering

Authors
Han, Jun YoungBark, Chung Wung
Issue Date
Oct-2015
Publisher
AMER SCIENTIFIC PUBLISHERS
Keywords
BLFT Thin Films; Band Gap Tunability; RF Sputtering
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.15, no.10, pp.8228 - 8232
Journal Title
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
Volume
15
Number
10
Start Page
8228
End Page
8232
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/10106
DOI
10.1166/jnn.2015.11438
ISSN
1533-4880
Abstract
Achieving wide band gap tunability in ferroelectric perovskite oxides is desirable for the development of photovoltaic device applications and solar cells. To tune the wide band gap of perovskite oxides, ferroelectric iron doped BLT thin films (BLFT) on SrTiO3 substrates were fabricated by RF sputtering with simple control of the oxygen content. The structural and optical properties were analyzed by X-ray diffraction, scanning electron microscopy and ultraviolet-visible absorption spectroscopy. As the oxygen content in the mixed Ar+ O-2 atmosphere was increased from 0% to 50%, the optical band gap of the thin films were decreased from 2.8 eV to 2.64 eV. The BLFT film deposited at an Ar/O-2 ratio of 1/1 exhibited a significantly lower optical band gap than the other samples. This simple sputtering approach to controlling the band gap with a simple method can provide a new candidate tool for manipulating optoelectronics devices.
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College of IT Convergence (Department of Electrical Engineering)
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