Effects of post-annealing treatment on the properties of reactive sputtered cuprous-oxide thin films
DC Field | Value | Language |
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dc.contributor.author | Jung, Yu Sup | - |
dc.contributor.author | Kim, Kyung Hwan | - |
dc.date.available | 2020-02-28T08:43:14Z | - |
dc.date.created | 2020-02-06 | - |
dc.date.issued | 2015-09 | - |
dc.identifier.issn | 0374-4884 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/10219 | - |
dc.description.abstract | The p-type cuprous-oxide (Cu2O) thin films were fabricated by using the reactive sputtering method. As-deposited p-type Cu2O thin films were post-annealed in argon gas ambient. The as-deposited p-type Cu2O thin films exhibited Cu2O (111), Cu2O (220), and Cu2O (200) X-ray diffraction peaks. Increasing the post-annealing temperature in Ar gas resulted in a shifting of the Cu2O (111) and the Cu2O (200) diffraction peaks towards lower and higher angles, respectively. At an annealing temperature of 550 A degrees C, the Cu2O (200) diffraction peaks was strongest. The resistivity, hole concentration and mobility of the p-type Cu2O thin film with an annealing temperature of 550 A degrees C were 179.7 Omega A center dot cm, 1.994 x 10(15) cm(-3) and 17.43 cm(2)/V center dot s, respectively. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | KOREAN PHYSICAL SOC | - |
dc.relation.isPartOf | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.subject | CU2O | - |
dc.subject | PHOTOCONDUCTIVITY | - |
dc.subject | CONDUCTION | - |
dc.subject | LAYER | - |
dc.title | Effects of post-annealing treatment on the properties of reactive sputtered cuprous-oxide thin films | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000362291000009 | - |
dc.identifier.doi | 10.3938/jkps.67.1013 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.67, no.6, pp.1013 - 1017 | - |
dc.identifier.kciid | ART002030300 | - |
dc.identifier.scopusid | 2-s2.0-84943153774 | - |
dc.citation.endPage | 1017 | - |
dc.citation.startPage | 1013 | - |
dc.citation.title | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | - |
dc.citation.volume | 67 | - |
dc.citation.number | 6 | - |
dc.contributor.affiliatedAuthor | Jung, Yu Sup | - |
dc.contributor.affiliatedAuthor | Kim, Kyung Hwan | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | Cuprous oxide | - |
dc.subject.keywordAuthor | Cu2O | - |
dc.subject.keywordAuthor | Post-annealing treatment | - |
dc.subject.keywordAuthor | Reactive sputtering | - |
dc.subject.keywordAuthor | Facing-targets sputtering | - |
dc.subject.keywordPlus | CU2O | - |
dc.subject.keywordPlus | PHOTOCONDUCTIVITY | - |
dc.subject.keywordPlus | CONDUCTION | - |
dc.subject.keywordPlus | LAYER | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Physics, Multidisciplinary | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
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