Effective modification of Pd surfaces with TiO2 promoters using selective chemical vapor deposition and the effect on catalytic performance improvement
- Authors
- Um, Jo-Eun; Yoon, Won Jung; Choi, Hyung-Wook; Kim, Woo-Jae
- Issue Date
- 25-Nov-2014
- Publisher
- ELSEVIER SCIENCE INC
- Keywords
- TiO2 promoters; Selective chemical vapor deposition; Pd catalyst; Acetylene hydrogenation; High ethylene selectivity
- Citation
- JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v.20, no.6, pp.4183 - 4187
- Journal Title
- JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY
- Volume
- 20
- Number
- 6
- Start Page
- 4183
- End Page
- 4187
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/12105
- DOI
- 10.1016/j.jiec.2014.01.018
- ISSN
- 1226-086X
- Abstract
- In this paper, we describe a novel method for selectively attaching TiO2 promoters on Pd surfaces in Pd/SiO2 catalysts using selective chemical vapor deposition (CVD). Ti was selectively deposited on Pd active sites over a SiO2 support under a hydrogen atmosphere when titanium tetraisopropoxide was used as a Ti precursor. The Pd-Ti/SiO2 catalyst modified by CVD exhibits approximately 1.8 times higher ethylene selectivity than the un-modified Pd/SiO2 catalyst in the selective hydrogenation of acetylene due to the effective geometric modification of the Pd surface, which is beneficial to ethylene selectivity, by the selectively deposited Ti species. (C) 2014 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.
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Collections - IT융합대학 > 전기공학과 > 1. Journal Articles
- 공과대학 > 화공생명공학과 > 1. Journal Articles
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