Effects of the Duty Ratio on the Niobium Oxide Film Deposited by Pulsed-DC Magnetron Sputtering Methods
DC Field | Value | Language |
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dc.contributor.author | Eom, Ji Mi | - |
dc.contributor.author | Oh, Hyun Gon | - |
dc.contributor.author | Cho, Il Hwan | - |
dc.contributor.author | Kwon, Sang Jik | - |
dc.contributor.author | Cho, Eou Sik | - |
dc.date.available | 2020-02-28T22:44:03Z | - |
dc.date.created | 2020-02-06 | - |
dc.date.issued | 2013-11 | - |
dc.identifier.issn | 1533-4880 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/14173 | - |
dc.description.abstract | Niobium oxide (Nb2O5) films were deposited on p-type Si wafers and sodalime glasses at a room temperature using in-line pulsed-DC magnetron sputtering system with various duty ratios. The different duty ratio was obtained by varying the reverse voltage time of pulsed DC power from 0.5 to 2.0 mu s at the fixed frequency of 200 kHz. From the structural and optical characteristics of the sputtered NbOx films, it was possible to obtain more uniform and coherent NbOx films in case of the higher reverse voltage time as a result of the cleaning effect on the Nb2O5 target surface. The electrical characteristics from the metal-insulator-semiconductor (MIS) fabricated with the NbOx films shows the leakage currents are influenced by the reverse voltage time and the Schottky barrier diode characteristics. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
dc.relation.isPartOf | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
dc.subject | THIN-FILMS | - |
dc.title | Effects of the Duty Ratio on the Niobium Oxide Film Deposited by Pulsed-DC Magnetron Sputtering Methods | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000328706800099 | - |
dc.identifier.doi | 10.1166/jnn.2013.7816 | - |
dc.identifier.bibliographicCitation | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.13, no.11, pp.7760 - 7765 | - |
dc.identifier.scopusid | 2-s2.0-84891532232 | - |
dc.citation.endPage | 7765 | - |
dc.citation.startPage | 7760 | - |
dc.citation.title | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
dc.citation.volume | 13 | - |
dc.citation.number | 11 | - |
dc.contributor.affiliatedAuthor | Eom, Ji Mi | - |
dc.contributor.affiliatedAuthor | Kwon, Sang Jik | - |
dc.contributor.affiliatedAuthor | Cho, Eou Sik | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | Niobium Oxide (Nb2O5) | - |
dc.subject.keywordAuthor | Pulsed-DC Sputtering | - |
dc.subject.keywordAuthor | Duty Ratio | - |
dc.subject.keywordAuthor | Reverse Voltage Time | - |
dc.subject.keywordAuthor | Schottky Barrier | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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