Effect of working pressure on the characteristics of Ga-Al doped ZnO thin films deposited by the facing targets sputtering method
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Ki Hyun | - |
dc.contributor.author | Choi, Hyung Wook | - |
dc.contributor.author | Kim, Kyung Hwan | - |
dc.date.available | 2020-02-29T00:42:31Z | - |
dc.date.created | 2020-02-06 | - |
dc.date.issued | 2013-04 | - |
dc.identifier.issn | 1229-9162 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/14669 | - |
dc.description.abstract | Ga-Al doped zinc oxide (GAZO) transparent conductive films were deposited on glass substrates by the facing targets sputtering (FTS) method. The GAZO thin film fabricated in argon atmosphere contained Ga and Al, as confirmed by energy dispersive x-ray spectroscopy (EDX). The effects of the working pressure on the structural, optical and electrical properties of the GAZO films were investigated. As the working pressure was increased, the electrical properties were decreased and the optical properties remained constant. As a result, the GAZO thin films deposited on the glass substrates showed 90% transmittance in the visible range (400-800 nm). And we obtained GAZO thin film with the lowest resistivity of 1.186 x 10(-3) Omega.cm. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | KOREAN ASSOC CRYSTAL GROWTH, INC | - |
dc.relation.isPartOf | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
dc.subject | CONDUCTIVE ZNO | - |
dc.subject | TRANSPARENT | - |
dc.title | Effect of working pressure on the characteristics of Ga-Al doped ZnO thin films deposited by the facing targets sputtering method | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000332229000012 | - |
dc.identifier.bibliographicCitation | JOURNAL OF CERAMIC PROCESSING RESEARCH, v.14, no.2, pp.194 - 197 | - |
dc.identifier.kciid | ART002328444 | - |
dc.identifier.scopusid | 2-s2.0-84886768312 | - |
dc.citation.endPage | 197 | - |
dc.citation.startPage | 194 | - |
dc.citation.title | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
dc.citation.volume | 14 | - |
dc.citation.number | 2 | - |
dc.contributor.affiliatedAuthor | Kim, Ki Hyun | - |
dc.contributor.affiliatedAuthor | Choi, Hyung Wook | - |
dc.contributor.affiliatedAuthor | Kim, Kyung Hwan | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | GZO | - |
dc.subject.keywordAuthor | AZO | - |
dc.subject.keywordAuthor | GAZO | - |
dc.subject.keywordAuthor | Facing Targets Sputtering | - |
dc.subject.keywordPlus | CONDUCTIVE ZNO | - |
dc.subject.keywordPlus | TRANSPARENT | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
1342, Seongnam-daero, Sujeong-gu, Seongnam-si, Gyeonggi-do, Republic of Korea(13120)031-750-5114
COPYRIGHT 2020 Gachon University All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.