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Surface and Internal Reactions of ZnO Nanowires: Etching and Bulk Defect Passivation by H Atoms

Authors
Kim, WooseokKwak, GeunjaeJung, MinbokJo, Sam K.Miller, James B.Gellman, Andrew J.Yong, Kijung
Issue Date
2-Aug-2012
Publisher
AMER CHEMICAL SOC
Citation
JOURNAL OF PHYSICAL CHEMISTRY C, v.116, no.30, pp.16093 - 16097
Journal Title
JOURNAL OF PHYSICAL CHEMISTRY C
Volume
116
Number
30
Start Page
16093
End Page
16097
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/16227
DOI
10.1021/jp304191m
ISSN
1932-7447
Abstract
Reactions of ZnO nanowires (NWs) with atomic hydrogen were investigated with temperature-programmed desorption (TPD) mass spectrometry, scanning electron microscopy, and photoluminescence (PL) spectroscopy. During TPD, molecular H-2, H2O, and atomic Zn desorbed from ZnO NWs pretreated with atomic H at 220 K. Three distinct H-2 TPD peaks, two from surface H states and one from a bulk H state, were identified. The TPD assignment of the bulk H state was corroborated by significantly suppressed emission at 564 nm and enhanced emission at 375 nm in PL experiments. Etching of ZnO NWs by atomic H was confirmed by desorption of molecular H2O and atomic Zn in TPD and by electron microscopic images of H-treated ZnO NWs. A mechanistic model for underlying H/ZnO NW reactions is proposed and discussed.
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