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진공 솔더링 공정 중 웨이퍼 온도균일화 제어Temperature Uniformity Control of Wafer During Vacuum Soldering Process

Other Titles
Temperature Uniformity Control of Wafer During Vacuum Soldering Process
Authors
강민식지원호윤우현
Issue Date
2012
Publisher
한국반도체디스플레이기술학회
Keywords
Vacuum Soldering; Wafer Bonding; Temperature Uniformity; Stepwise Iterative Control; Heating Profile
Citation
반도체디스플레이기술학회지, v.11, no.2, pp.63 - 69
Journal Title
반도체디스플레이기술학회지
Volume
11
Number
2
Start Page
63
End Page
69
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/17152
ISSN
1738-2270
Abstract
As decreasing size of chips, the need of wafer level packaging is increased in semi-conductor and display industries. Temperature uniformity is a crucial factor in vacuum soldering process to guarantee quality of bonding between chips and wafer. In this paper, a stepwise iterative algorithm has been suggested to obtain output profile of each heat source. Since this algorithm is based on open-loop stepwise iterative experimental technique, it is easier to implement and cost effective than real time feedback controls. Along with some experiments, it was shown that the suggested algorithm can remarkably improve temperature uniformity of wafer during whole heating process compared with the ordinary manual trial-and error method.
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Kang, Min Sig
Engineering (기계·스마트·산업공학부(기계공학전공))
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