PPMgLN ridge waveguide fabrication with low optical scattering loss using dry-etch process
- Authors
- Kang, T.-Y.; Park, J.-H.; Lim, T.-H.; Lee, H.-Y.; Kim, K.-H.
- Issue Date
- 2012
- Citation
- Technical Digest - 2012 17th Opto-Electronics and Communications Conference, OECC 2012, pp.651 - 652
- Journal Title
- Technical Digest - 2012 17th Opto-Electronics and Communications Conference, OECC 2012
- Start Page
- 651
- End Page
- 652
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/17478
- DOI
- 10.1109/OECC.2012.6276774
- ISSN
- 0000-0000
- Abstract
- We fabricated QPM-SHG (quasi-Phase-Matched Second-Harmonic-Generation) ridge type waveguide using PPMgLN Dry-etch Fabricaion process. We measured sidewall Roughness of ridge waveguide using AFM. We calculated optical scattering Loss with sidewall roughness RMS and Ridge Waveguide structure inspection result. As a result of calculated loss, sidewall scattering roughness little contributes to the propagation loss. By using optimized period and NLD dry-etch Process, high conversion efficiency can be obtained by using a SHG device at room temperature. © 2012 IEEE.
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