Effects of Radio-Frequency Sputtering Power on Low Temperature Formation of MoS2 Thin Films on Soda-Lime Glass Substrates
DC Field | Value | Language |
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dc.contributor.author | Zhao, Zhenqian | - |
dc.contributor.author | Yin, Min Yu | - |
dc.contributor.author | Kwon, Sang Jik | - |
dc.contributor.author | Cho, Eou-Sik | - |
dc.date.available | 2020-04-16T06:35:12Z | - |
dc.date.created | 2020-04-14 | - |
dc.date.issued | 2020-08 | - |
dc.identifier.issn | 1533-4880 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/27295 | - |
dc.description.abstract | For the realization of the economical and reliable fabrication process of molybdenum disulfide (MoS2) layers, MoS2 thin films were directly formed a on soda-lime glass substrate by RF sputtering and subsequent rapid thermal annealing (RTA) at a temperature range of 400-550 degrees C. Using scanning electron microscopy and atomic force microscopy, it was possible to investigate more stable surface morphologies of MoS2 layers at lower RF sputtering powers irrespective of the RTA temperature. Even at an RTA temperature of less than 550 degrees C, the Raman exhibited more distinct E-2g(1) and A(g)(1) peaks for the MoS2 layers sputtered at lower RF powers. The X-ray photoelectron spectroscopy results revealed that more distinct peaks were observed at a higher RTA temperature, and the peak positions were moved to higher energies at a lower RF sputtering power. Based on the Hall measurements, higher carrier densities were obtained for the MoS2 layers sputtered at lower RF powers. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
dc.relation.isPartOf | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
dc.title | Effects of Radio-Frequency Sputtering Power on Low Temperature Formation of MoS2 Thin Films on Soda-Lime Glass Substrates | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000518698800045 | - |
dc.identifier.doi | 10.1166/jnn.2020.17849 | - |
dc.identifier.bibliographicCitation | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.20, no.8, pp.4892 - 4898 | - |
dc.description.isOpenAccess | N | - |
dc.citation.endPage | 4898 | - |
dc.citation.startPage | 4892 | - |
dc.citation.title | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
dc.citation.volume | 20 | - |
dc.citation.number | 8 | - |
dc.contributor.affiliatedAuthor | Zhao, Zhenqian | - |
dc.contributor.affiliatedAuthor | Yin, Min Yu | - |
dc.contributor.affiliatedAuthor | Kwon, Sang Jik | - |
dc.contributor.affiliatedAuthor | Cho, Eou-Sik | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | Molybdenum Disulfide | - |
dc.subject.keywordAuthor | Soda-Lime Glass | - |
dc.subject.keywordAuthor | Rapid Thermal Annealing (RTA) | - |
dc.subject.keywordAuthor | RF Sputtering Powers | - |
dc.subject.keywordPlus | THERMAL-EXPANSION | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
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