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Effects of O2/Ar ratio on ITO Thin Film Deposited on Polycarbonate Substrate using In-Line DC Magnetron Sputtering
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 조의식 | - |
| dc.date.available | 2020-04-24T14:43:52Z | - |
| dc.date.issued | 2009-11-19 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/32850 | - |
| dc.title | Effects of O2/Ar ratio on ITO Thin Film Deposited on Polycarbonate Substrate using In-Line DC Magnetron Sputtering | - |
| dc.title.alternative | Effects of O2/Ar ratio on ITO Thin Film Deposited on Polycarbonate Substrate using In-Line DC Magnetron Sputtering | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | International Workshop on Flexible & Printable Electronics 2009 | - |
| dc.citation.conferencePlace | 대한민국 | - |
| dc.citation.conferencePlace | Muju Resort, Korea | - |
| dc.citation.endPage | 156 | - |
| dc.citation.startPage | 156 | - |
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