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Origin of electrically active and inactive defects associated with F impurity in SiO2

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dc.contributor.author주형규-
dc.date.available2020-04-24T17:45:36Z-
dc.date.issued2008-10-24-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/34775-
dc.titleOrigin of electrically active and inactive defects associated with F impurity in SiO2-
dc.title.alternativeOrigin of electrically active and inactive defects associated with F impurity in SiO2-
dc.typeConference-
dc.citation.conferenceName한국 물리학회 2008년 추계 학술대회-
dc.citation.conferencePlace대한민국-
dc.citation.conferencePlace전라남도 광주시 김대중 컨벤션 센터-
dc.citation.endPage163-
dc.citation.startPage163-
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