Origin of electrically active and inactive defects associated with F impurity in SiO2
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 주형규 | - |
dc.date.available | 2020-04-24T17:45:36Z | - |
dc.date.issued | 2008-10-24 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/34775 | - |
dc.title | Origin of electrically active and inactive defects associated with F impurity in SiO2 | - |
dc.title.alternative | Origin of electrically active and inactive defects associated with F impurity in SiO2 | - |
dc.type | Conference | - |
dc.citation.conferenceName | 한국 물리학회 2008년 추계 학술대회 | - |
dc.citation.conferencePlace | 대한민국 | - |
dc.citation.conferencePlace | 전라남도 광주시 김대중 컨벤션 센터 | - |
dc.citation.endPage | 163 | - |
dc.citation.startPage | 163 | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
1342, Seongnam-daero, Sujeong-gu, Seongnam-si, Gyeonggi-do, Republic of Korea(13120)031-750-5114
COPYRIGHT 2020 Gachon University All Rights Reserved.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.