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A Study of ITO Etching Characteristic Depending on Variation Pulse Repetition Rate of the YVO4 Laser for AC PDP

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dc.contributor.author권상직-
dc.date.available2020-04-24T20:38:19Z-
dc.date.issued2007-11-14-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/35802-
dc.titleA Study of ITO Etching Characteristic Depending on Variation Pulse Repetition Rate of the YVO4 Laser for AC PDP-
dc.title.alternativeA Study of ITO Etching Characteristic Depending on Variation Pulse Repetition Rate of the YVO4 Laser for AC PDP-
dc.typeConference-
dc.citation.conferenceName2007 Dry Process International Symposium-
dc.citation.conferencePlace일본-
dc.citation.conferencePlaceTokyo, Japan-
dc.citation.endPage128-
dc.citation.startPage127-
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IT융합대학 > 전자공학과 > 2. Conference Papers

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반도체대학 (반도체·전자공학부)
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