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ZnO buffer layer 제작과 c-축 배향성 향상으로 인한 FBAR 성능 개선에 관한 연구

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dc.contributor.author신영화-
dc.date.available2020-04-24T23:36:13Z-
dc.date.issued2006-11-11-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/36595-
dc.titleZnO buffer layer 제작과 c-축 배향성 향상으로 인한 FBAR 성능 개선에 관한 연구-
dc.title.alternativePerformance of FBAR devices was enhanced by fabrication of ZnO buffer layer and improvement of c-axis orientation-
dc.typeConference-
dc.citation.conferenceName2006년도 한국전기전자재료학회 추계학술대회-
dc.citation.conferencePlaceSouth Korea-
dc.citation.conferencePlace전북대학교-
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