실리사이드화된 극저층 접합의 형성 및 특성 연구

신영화

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실리사이드화된 극저층 접합의 형성 및 특성 연구

Authors: 신영화

URI: https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/40509

Place: 대한민국

metadata.conference.dc.citation.conferenceName: 반도체공동연구소(서울)

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Appears in Collections: ETC > 2. Conference Papers

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1342, Seongnam-daero, Sujeong-gu, Seongnam-si, Gyeonggi-do, Republic of Korea(13120)031-750-5114

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