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Potential-current co-adjusted pulse electrodeposition for highly (110)-oriented Bi2Te3-xSex films

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dc.contributor.authorKim, Jiwon-
dc.contributor.authorLee, Kyu Hyoung-
dc.contributor.authorKim, Sung Wng-
dc.contributor.authorLim, Jae-Hong-
dc.date.available2020-06-16T04:35:45Z-
dc.date.created2020-06-16-
dc.date.issued2019-05-
dc.identifier.issn0925-8388-
dc.identifier.urihttps://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/53887-
dc.description.abstractControllable crystal orientation is necessary to obtain high thermoelectric performance in thin films of Bi2Te3 alloys. In the present study, highly (110)-oriented thin films of n-type Bi2Te3-xSex with improved composition controllability are prepared through a simple electrodeposition-based process. Using potential-current co-adjusted pulse electrodeposition (PCP-ED) with adjustments to the zero current during the off-time period enables the fabrication of dense Bi2Te3-xSex thin films with highly (110)-oriented grains by minimizing the ionic gradient (Bi3+, Te2-, Se2-) between the substrate and solution. The power factor of the PCP-ED thin film was much higher than that of the dendritic Bi2Te3-xSex thin film fabricated by constant-potentiostatic electrodeposition (C-ED) because of the simultaneous enhancement of electrical conductivity and Seebeck coefficient. The high power factor of similar to 1920 mu W/m.K-2, which is the best value among reported n-type Bi2Te3-based thin films, was obtained at room temperature after low-temperature annealing at 200 degrees C by exploiting the crystallinity enhancement and carrier concentration optimization. (C) 2019 Elsevier B.V. All rights reserved.-
dc.language영어-
dc.language.isoen-
dc.publisherELSEVIER SCIENCE SA-
dc.relation.isPartOfJOURNAL OF ALLOYS AND COMPOUNDS-
dc.titlePotential-current co-adjusted pulse electrodeposition for highly (110)-oriented Bi2Te3-xSex films-
dc.typeArticle-
dc.type.rimsART-
dc.description.journalClass1-
dc.identifier.wosid000462592500088-
dc.identifier.doi10.1016/j.jallcom.2019.01.301-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.787, pp.767 - 771-
dc.description.isOpenAccessN-
dc.citation.endPage771-
dc.citation.startPage767-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume787-
dc.contributor.affiliatedAuthorLim, Jae-Hong-
dc.type.docTypeArticle-
dc.subject.keywordAuthorThermoelectric-
dc.subject.keywordAuthorBi2Te3-
dc.subject.keywordAuthorThin film-
dc.subject.keywordAuthorCrystal orientation-
dc.subject.keywordAuthorElectrodeposition-
dc.subject.keywordPlusHIGH-PERFORMANCE-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusOPTIMIZATION-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusLAYERS-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
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