Chemical Doping Effects on CVD-Grown Multilayer MoSe2 Transistor

Abstract

Multilayer transition metal dichalcogenides (TMDs) potentially provide opportunities for large-area electronics, including flexible displays and wearable sensors. However, most TMDs suffer from a Schottky barrier (SB) and nonuniform defects, which severely limit their electrical performances. Here, a novel chemical doping scheme is presented using poly-(diketopyrrolopyrrole-terthiophene) (PDPP3T) to compensate the defects and SB of multilayer molybdenum diselenide (MoSe2), exhibiting greatly enhanced electrical characteristics, including on-current (approximate to 2000-fold higher) and photoresponsivity (approximate to 10-fold larger) over the baseline MoSe2 device. Based on comprehensive analysis using X-ray photoelectron spectroscopy, grazing incidence wide-angle X-ray diffraction, atomic force microscopy, and near-edge X-ray absorption of fine structure, it is shown that two mechanisms (dipole-induced and charge-transfer doping effects) account for such enhancements in the multilayer MoSe2 device. The methodical generality of the strong n-doping behavior of multilayer MoSe2 is further demonstrated by applying thiophene instead of PDPP3T.