Fabrication of ON/OFF switching response based on n-Ni-doped MoO3/p-Si junction diodes using Ni-MoO3 thin films as n-type layer prepared by JNS pyrolysis technique
- Authors
- Balaji, M.; Chandrasekaran, J.; Raja, M.; Marnadu, R.; Ramamurthy, M.; Shkir, Mohd.
- Issue Date
- Feb-2020
- Publisher
- SPRINGER HEIDELBERG
- Keywords
- Ni doped MoO3 films; I-V characterization; n-NiMoO3; p-si diode; JNS pyrolysis; Ideality factor
- Citation
- APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.126, no.3
- Journal Title
- APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
- Volume
- 126
- Number
- 3
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/81238
- DOI
- 10.1007/s00339-020-3392-0
- ISSN
- 0947-8396
- Abstract
- The influence of nickel (Ni) doping concentrations on structural, optical, electrical and diode properties of molybdenum trioxide (MoO3) thin films has been studied systematically. Ni-doped MoO3 films and diodes were prepared for various doping concentrations of Ni such as 0, 3, 6 and 9 wt.% by jet nebulizer spray (JNS) pyrolysis technique. The structural properties of Ni-doped MoO3 films were analyzed by X-ray diffraction (XRD) pattern and scanning electron microscopy (SEM). The prepared films were exhibited in the orthorhombic crystal structure and sub-microsized plate-like surface morphology. The energy-dispersive X-ray spectroscopy (EDX) analysis confirmed the presence of Ni, Mo and O elements in the prepared films. Ultraviolet-visible (UV-vis) analysis results showed that the absorbance decreases with the increasing of Ni doping concentration and the minimum band gap energy (E-g=2.25) was obtained for 9 wt.% Ni-doped MoO3 film. From current-voltage (I-V) characterization, the conductivity is increased by increasing the Ni doping concentration in MoO3 thin films. The diode measurements were performed in darkness and under light illumination of a halogen lamp. The methods of I-V, Cheung's and Norde were used to calculate the diode parameters of ideality factor (n), barrier height (Phi (b)) and sheet resistance (R-s). Also, the light ON/OFF switching response of the fabricated n-NiMoO3/p-Si diodes was analyzed.
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