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Gas Barrier Performance of Hexagonal Boron Nitride Monolayers Grown on Copper Foils with Electrochemical Polishing

Authors
Lee, Chil HyoungChoi, Go BongKim, Eun MiLee, JonghoLee, JaegeunMoon, Hi GyuKim, Myung JongKim, Yoong AhmSeo, Tae Hoon
Issue Date
May-2021
Publisher
MDPI
Keywords
Electro-chemical polishing; Gas barrier; H-BN; Two-dimensional
Citation
APPLIED SCIENCES-BASEL, v.11, no.10
Journal Title
APPLIED SCIENCES-BASEL
Volume
11
Number
10
URI
https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/81363
DOI
10.3390/app11104599
ISSN
2076-3417
Abstract
The demand for high-performance two-dimensional gas barrier materials is increasing owing to their potential for application in optoelectronic devices. These materials can help the devices maintain their properties over a long period. Therefore, in this study, we investigated the gas barrier performance of hexagonal boron nitride (h-BN) monolayers grown on copper foils via electrochemical polishing (ECP). The ECP treatment helped reduce the surface roughness of the copper foils. As a result, the nucleation density was reduced and highly crystalline h-BN monolayers were produced. The gas barrier performance of h-BN monolayers on copper foils with ECP was comparable to that of graphene. Our finding demonstrates the potential of monolayer h-BN as a high-performance and economical gas barrier material for organic-based optoelectronic devices. © 2021 by the authors. Licensee MDPI, Basel, Switzerland.
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