Gas Barrier Performance of Hexagonal Boron Nitride Monolayers Grown on Copper Foils with Electrochemical Polishing
- Authors
- Lee, Chil Hyoung; Choi, Go Bong; Kim, Eun Mi; Lee, Jongho; Lee, Jaegeun; Moon, Hi Gyu; Kim, Myung Jong; Kim, Yoong Ahm; Seo, Tae Hoon
- Issue Date
- May-2021
- Publisher
- MDPI
- Keywords
- Electro-chemical polishing; Gas barrier; H-BN; Two-dimensional
- Citation
- APPLIED SCIENCES-BASEL, v.11, no.10
- Journal Title
- APPLIED SCIENCES-BASEL
- Volume
- 11
- Number
- 10
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/81363
- DOI
- 10.3390/app11104599
- ISSN
- 2076-3417
- Abstract
- The demand for high-performance two-dimensional gas barrier materials is increasing owing to their potential for application in optoelectronic devices. These materials can help the devices maintain their properties over a long period. Therefore, in this study, we investigated the gas barrier performance of hexagonal boron nitride (h-BN) monolayers grown on copper foils via electrochemical polishing (ECP). The ECP treatment helped reduce the surface roughness of the copper foils. As a result, the nucleation density was reduced and highly crystalline h-BN monolayers were produced. The gas barrier performance of h-BN monolayers on copper foils with ECP was comparable to that of graphene. Our finding demonstrates the potential of monolayer h-BN as a high-performance and economical gas barrier material for organic-based optoelectronic devices. © 2021 by the authors. Licensee MDPI, Basel, Switzerland.
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