Density functional theory study on the modification of silicon nitride surface by fluorine-containing molecules (vol 554, 149481, 2021)
DC Field | Value | Language |
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dc.contributor.author | Chowdhury, T. | - |
dc.contributor.author | Hidayat, R. | - |
dc.contributor.author | Kim, Hye-Lee | - |
dc.contributor.author | Mayangsari, T.R. | - |
dc.contributor.author | Cho, Seongjae | - |
dc.contributor.author | Park, Sangjoon | - |
dc.contributor.author | Jung, Jongwan | - |
dc.contributor.author | Lee, Won-Jun | - |
dc.date.accessioned | 2022-09-10T01:40:09Z | - |
dc.date.available | 2022-09-10T01:40:09Z | - |
dc.date.created | 2022-08-13 | - |
dc.date.issued | 2022-11 | - |
dc.identifier.issn | 0169-4332 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/85442 | - |
dc.description.abstract | The authors regret an incorrect activation energy value in Table 1. When constructing Table 1, we used the activation energy value taken from the reference [1] for the fluorination reaction of silicon oxide with HF. However, the value was corrected from 0.18 eV to 0.77 eV in the erratum [2]. Therefore, we would like to provide the new Table 1 with the corrected value. The third sentence in the second paragraph of page 8 should now read, as follows: The EA values for the fluorination reaction of silicon oxide and silicon surfaces by HF were 0.77 eV and 1.22 eV, as presented in the previous report [22], while it is 2.07 eV for silicon nitride as determined in the present work”. Also, the third sentence of the fourth paragraph of page 8 should now read, as follows: In the TS on the silicon oxide or silicon substrate, a four-membered ring (–Si–O–H–F–) geometry is formed, or the HF is bonded to SiH* to form SiH2F* [22]. These corrections do not change the overall conclusion of the paper. The authors would like to apologize for any inconvenience caused. © 2021 Elsevier B.V. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | Elsevier | - |
dc.relation.isPartOf | Applied Surface Science | - |
dc.title | Density functional theory study on the modification of silicon nitride surface by fluorine-containing molecules (vol 554, 149481, 2021) | - |
dc.type | Article | - |
dc.type.rims | ART | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000848287800002 | - |
dc.identifier.doi | 10.1016/j.apsusc.2022.154355 | - |
dc.identifier.bibliographicCitation | Applied Surface Science, v.602 | - |
dc.description.isOpenAccess | Y | - |
dc.identifier.scopusid | 2-s2.0-85135140982 | - |
dc.citation.title | Applied Surface Science | - |
dc.citation.volume | 602 | - |
dc.contributor.affiliatedAuthor | Cho, Seongjae | - |
dc.type.docType | Correction | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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