Nanoscale Channel Gate-Tunable Diodes Obtained by Asymmetric Contact and Adhesion Lithography on Fluoropolymers
DC Field | Value | Language |
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dc.contributor.author | Kim, Minseo | - |
dc.contributor.author | Kim, Seongjae | - |
dc.contributor.author | Yoo, Hocheon | - |
dc.date.accessioned | 2023-12-28T01:00:18Z | - |
dc.date.available | 2023-12-28T01:00:18Z | - |
dc.date.issued | 2023-08 | - |
dc.identifier.issn | 1613-6810 | - |
dc.identifier.issn | 1613-6829 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/89831 | - |
dc.description.abstract | Adhesion lithography offers to fabrication of coplanar asymmetric nanogap electrodes with a low-cost and facile process. In this study, a gate-tunable diode with coplanar asymmetric nanogap is fabricated using adhesion lithography. A fluoropolymer material is introduced to the adhesion lithography process to ensure a manufacturing patterning process yield as high as 96.7%. The asymmetric electrodes formed a built-in potential, leading to rectifying behavior. The coplanar electrode structure allowed the use of a gate electrode in vertical contact with the channel, resulting in gate-tunable diode characteristics. The nanoscale channel induced a high current density (3.38 x 10(-7) A center dot cm(-1)), providing a high rectification ratio (1.67 x 10(5) A center dot A(-1)). This rectifier diode is confirmed to operate with pulsed input signals and suggests the gate-tunability of nanogap diodes. | - |
dc.language | 영어 | - |
dc.language.iso | ENG | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.title | Nanoscale Channel Gate-Tunable Diodes Obtained by Asymmetric Contact and Adhesion Lithography on Fluoropolymers | - |
dc.type | Article | - |
dc.identifier.wosid | 000975185400001 | - |
dc.identifier.doi | 10.1002/smll.202208144 | - |
dc.identifier.bibliographicCitation | SMALL, v.19, no.35 | - |
dc.description.isOpenAccess | N | - |
dc.identifier.scopusid | 2-s2.0-85153184615 | - |
dc.citation.title | SMALL | - |
dc.citation.volume | 19 | - |
dc.citation.number | 35 | - |
dc.type.docType | Article | - |
dc.publisher.location | 독일 | - |
dc.subject.keywordAuthor | adhesion lithography | - |
dc.subject.keywordAuthor | DNTT | - |
dc.subject.keywordAuthor | nanogap | - |
dc.subject.keywordAuthor | organic semiconductors | - |
dc.subject.keywordAuthor | spectroscopy analysis | - |
dc.subject.keywordPlus | FIELD-EFFECT TRANSISTORS | - |
dc.subject.keywordPlus | THIN-FILM TRANSISTORS | - |
dc.subject.keywordPlus | TRANSPORT | - |
dc.subject.keywordPlus | DEVICES | - |
dc.subject.keywordPlus | LENGTH | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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