Smooth, Chemically Altered Nucleating Platform for Abrupt Performance Enhancement of Ultrathin Cu-Layer-Based Transparent Electrodes
- Authors
- Vo, Tran Thi Bao; Lim, Jaeun; Joo, Si Hyeon; Kim, Heechang; Lee, Taehyeong; Bae, Jong-Seong; Jeong, Eunwook; Kwon, Min-Suk; Yun, Jungheum; Choi, Dooho
- Issue Date
- Jul-2023
- Publisher
- AMER CHEMICAL SOC
- Keywords
- nucleating platform; ultrathin metallic films; visible transparency; electrical conductivity; metal; dielectric interface
- Citation
- NANO LETTERS, v.23, no.14, pp 6528 - 6535
- Pages
- 8
- Journal Title
- NANO LETTERS
- Volume
- 23
- Number
- 14
- Start Page
- 6528
- End Page
- 6535
- URI
- https://scholarworks.bwise.kr/gachon/handle/2020.sw.gachon/91653
- DOI
- 10.1021/acs.nanolett.3c01546
- ISSN
- 1530-6984
1530-6992
- Abstract
- Rapid advances in flexible optoelectronic devices necessitatetheconcomitant development of high-performance, cost-efficient, and flexibletransparent conductive electrodes (TCEs). This Letter reports an abruptenhancement in the optoelectronic characteristics of ultrathin Cu-layer-basedTCEs via Ar+-mediated modulation of the chemical and physicalstates of a ZnO support surface. This approach strongly regulatesthe growth mode for the subsequently deposited Cu layer, in additionto marked alteration to the ZnO/Cu interface states, resulting inexceptional TCE performance in the form of ZnO/Cu/ZnO TCEs. The resultantHaacke figure of merit (T (10)/R (s) ) of 0.063 & omega;(-1), 53% greater than that of the unaltered, otherwise identical structure,corresponds to a record-high value for Cu-layer-based TCEs. Moreover,the enhanced TCE performance in this approach is shown to be highlysustainable under severe simultaneous loadings of electrical, thermal,and mechanical stresses.
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