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Enhanced anisotropy in advanced semiconductor nanofabrication via ultralow electron temperature plasma for cryogenic etchingGo to Link

Kim, Min-Seok; Ahn, Jong Ha; Kim, Deok Hwan; Ha, Seok Hyeon; Chung, Chin-Wook

ArticleIssue Date2026CitationMaterials Science in Semiconductor Processing, v.202, pp 1 - 7PublisherElsevier Ltd
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