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In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potentialGo to Link

Park, Jin Woo; Chae, Myeong Gyoon; Kim, Doo San; Lee, Won Oh; Song, Han Dock; Choi, Changhwan; Yeom, Geun Young

ArticleIssue Date2018CitationJournal of Physics D: Applied Physics, v.51, no.44PublisherIOP Publishing Ltd.
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Influence of oxygen vacancies in ALD HfO2-x thin films on non-volatile resistive switching phenomena with a Ti/HfO2-x/Pt structureGo to Link

Sokolov, Andrey Sergeevich; Jeon, Yu-Rim; Kim, Sohyeon; Ku, Boncheol; Lim, Donghwan; Han, Hoonhee; Chae, Myeong Gyoon; Lee, Jaeho; Ha, Beom Gil; Choi, Changhwan

ArticleIssue Date2018CitationApplied Surface Science, v.434, pp 822 - 830PublisherElsevier BV
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