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Fabrication of Cu/Co bilayer gate electrodes using selective chemical vapor deposition and soft lithographic patterningGo to Link

Yang, Heejung; Lee, Jang-Sik; Kim, Sihyeong; Ko, Yeonkyu; Shin, Hyunjung; Lee, Jaegab; Kim, Chul S.; Sung, Myung Mo; Bae, Yangho; Cho, Beomseok, et al.

ArticleIssue Date2006CitationJournal of Applied Physics, v.100, no.11PublisherAmerican Institute of Physics
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