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전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

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SCIESCOPUS
Effects of postnitridation annealing on band gap and band offsets of nitrided Hf-silicate filmsGo to Link

Chung, KB; Cho, MH; Hwang, U; Kang, HJ; Suh, DC; Sohn, HC; Ko, DH; Kim, SH; Jeon, Hyeongtag

ArticleIssue Date2008CitationApplied Physics Letters, v.92, no.2, pp 1 - 3PublisherAmerican Institute of Physics
SCIESCOPUS
Thermodynamic properties and interfacial layer characteristics of HfO2 thin films deposited by plasma-enhanced atomic layer depositionGo to Link

Kim, Inhoe; Kuk, Seoungwoo; Kim, Seokhoon; Kim, Jinwoo; Jeon, Hyeongtag; Cho, MH; Chung, KB

ArticleIssue Date2007CitationApplied Physics Letters, v.90, no.22, pp 1 - 4PublisherAmerican Institute of Physics
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