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The properties of Ru films deposited by remote plasma atomic layer deposition on Ar plasma-treated SiO2Go to Link

Park, Taeyong; Choi, Dongjin; Choi, Hagyoung; Jeon, Hyeongtag

ArticleIssue Date2012Citationphysica status solidi (a) - applications and materials science, v.209, no.2, pp 302 - 305PublisherWiley - V C H Verlag GmbbH & Co.
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