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Atomic Layer Etching of SiO2 Utilizing Ultra-Low Electron Temperature PlasmaGo to Link

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Lim, Chang-Min; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2025CitationACS Applied Electronic Materials, v.7, no.10, pp 4520 - 4528PublisherAmerican Chemical Society
SCIESCOPUS
Damage-Free Plasma Source for Atomic-Scale ProcessingGo to Link

Park, Junyoung; Jung, Jiwon; Kim, Min-Seok; Lim, Chang-Min; Choi, Jung-Eun; Kim, Nayeon; Kim, Ju-Ho; Chung, Chin-Wook

ArticleIssue Date2024CitationNano Letters, v.24, no.37, pp 11462 - 11468PublisherAmerican Chemical Society
SCIESCOPUS
Experimental observation of enhanced electron cyclotron resonance heating and nonlocal electron kinetics induced by Ramsauer-Townsend effect in ultralow electron temperature plasmasGo to Link

Kim, Min-Seok; Lee, Jeong-Hyun; Choi, Jung-Eun; Chung, Chin-Wook

ArticleIssue Date2025CitationPHYSICAL REVIEW E, v.112, no.4, pp 1 - 5PublisherAMER PHYSICAL SOC
SCIESCOPUS
Low-damage etching of poly-Si and SiO<sub>2</sub> via a low-energy electron beam in inductively coupled CF<sub>4</sub> plasmaGo to Link

Jung, Jiwon; Kim, Jae-Hwi; Lim, Chang-Min; Choi, Jung-Eun; Bae, Junil; Kim, Hyung-Dong; Chung, Chin-Wook

ArticleIssue Date2024CitationPLASMA SOURCES SCIENCE & TECHNOLOGY, v.33, no.10, pp 1 - 10PublisherIOP Publishing Ltd
SCIESCOPUS
Realizing Vertical Etch Profiles in Fluorine-Rich Ar/CF4 PlasmaGo to Linkopen access

Park, Junyoung; Kim, Nayeon; Choi, Jung-Eun; Yeo, Yujin; Kim, Min-Seok; Seo, Beom-Jun; Chung, Chin-Wook

ArticleIssue Date2026CitationAdvanced Materials Interfaces, v.13, no.1, pp 1 - 9PublisherWILEY
SCOPUS
The impact of electron temperature on etch profiles in Ar/CF4 plasmasGo to Link

Kim, Nayeon; Park, Junyoung; Choi, Jung-Eun; Kim, Min-Seok; Lee, MyeongJae; Chung, Chin-Wook

ArticleIssue Date2025CitationProceedings of SPIE - The International Society for Optical Engineering, v.13429, pp 1 - 7PublisherSPIE
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