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Analysis of repetitive pulse discharge system for plasma source ion implantationGo to Link

Chung, Kyoung-Jae; Choe, Jae-Myeong; Hwang, Hui-Don; Kim, Gon Ho; Ko, Kwang Cheol; Hwang, Yong Seok

ArticleIssue Date2006CitationIEEE Conference Record of Power Modulator Symposium, pp 329 - 332
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Investigation of current on the conducting target biased with a large negative potential in the non-uniform plasmaGo to Link

Choe, Jae-Myung; Chung, Kyoung-Jae; Hwang, Hui-Dong; Hwang, Yong-Seok; Ko, Kwang-Cheol; Kim, Gon-Ho

ArticleIssue Date2006CitationJapanese Journal of Applied Physics, v.45, no.24-28, pp L686 - L689PublisherIOP Publishing Ltd
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