Analysis of repetitive pulse discharge system for plasma source ion implantation

Abstract

The analysis of the repetitive pulse discharge system for the plasma source ion implantation is investigated with both circuit simulation and experiment. In the circuit model, the ion and electron currents on a target are self-consistently varied with the applied voltage because the waveforms of repetitive pulse are affected by the internal properties of plasma, as well as the external circuit parameters. The circuit simulation reveals that not only the plasma properties, but also the circuit components, are important for pulse system to operate at high repetition-rate. The experiments are conducted with a plane electrode immersed in rf-driven argon plasmas. When negative high-voltage pulses are applied to the electrode, the current and voltage waveforms are measured and compared with the simulation results. Control parameters for high repetition-rate operation are discussed, based on the self-consistent circuit analysis of the pulse system.